DocumentCode :
1114582
Title :
A lateral COMFET made in thin silicon-on-insulator film
Author :
Colinge, Jean-Pierre ; Shang-Yi Chiang
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, CA
Volume :
7
Issue :
12
fYear :
1986
fDate :
12/1/1986 12:00:00 AM
Firstpage :
697
Lastpage :
699
Abstract :
Lateral conductivity-modulated FET´s (COMFET´s) have been fabricated using a silicon-on-insulator (SOI) CMOS process. High-speed low-voltage CMOS and medium-voltage COMFET´s have thus been produced on the same chips. The COMFET´s have a 80-V blocking capability in both the forward and reverse modes. Turn-off times of a few microseconds are obtained, which is comparable to values obtained in bulk COMFET´s. Due to the thinness of the silicon film in which the devices are made, the linear current density is limited to approximately 10 µA/µm.
Keywords :
Boron; CMOS process; Cathodes; Circuits; FETs; Fabrication; Implants; Medium voltage; Semiconductor films; Silicon on insulator technology;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1986.26524
Filename :
1486347
Link To Document :
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