DocumentCode
1114582
Title
A lateral COMFET made in thin silicon-on-insulator film
Author
Colinge, Jean-Pierre ; Shang-Yi Chiang
Author_Institution
Hewlett-Packard Laboratories, Palo Alto, CA
Volume
7
Issue
12
fYear
1986
fDate
12/1/1986 12:00:00 AM
Firstpage
697
Lastpage
699
Abstract
Lateral conductivity-modulated FET´s (COMFET´s) have been fabricated using a silicon-on-insulator (SOI) CMOS process. High-speed low-voltage CMOS and medium-voltage COMFET´s have thus been produced on the same chips. The COMFET´s have a 80-V blocking capability in both the forward and reverse modes. Turn-off times of a few microseconds are obtained, which is comparable to values obtained in bulk COMFET´s. Due to the thinness of the silicon film in which the devices are made, the linear current density is limited to approximately 10 µA/µm.
Keywords
Boron; CMOS process; Cathodes; Circuits; FETs; Fabrication; Implants; Medium voltage; Semiconductor films; Silicon on insulator technology;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1986.26524
Filename
1486347
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