• DocumentCode
    1114582
  • Title

    A lateral COMFET made in thin silicon-on-insulator film

  • Author

    Colinge, Jean-Pierre ; Shang-Yi Chiang

  • Author_Institution
    Hewlett-Packard Laboratories, Palo Alto, CA
  • Volume
    7
  • Issue
    12
  • fYear
    1986
  • fDate
    12/1/1986 12:00:00 AM
  • Firstpage
    697
  • Lastpage
    699
  • Abstract
    Lateral conductivity-modulated FET´s (COMFET´s) have been fabricated using a silicon-on-insulator (SOI) CMOS process. High-speed low-voltage CMOS and medium-voltage COMFET´s have thus been produced on the same chips. The COMFET´s have a 80-V blocking capability in both the forward and reverse modes. Turn-off times of a few microseconds are obtained, which is comparable to values obtained in bulk COMFET´s. Due to the thinness of the silicon film in which the devices are made, the linear current density is limited to approximately 10 µA/µm.
  • Keywords
    Boron; CMOS process; Cathodes; Circuits; FETs; Fabrication; Implants; Medium voltage; Semiconductor films; Silicon on insulator technology;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1986.26524
  • Filename
    1486347