Title : 
Analysis of distributed threshold voltage transistors
         
        
            Author : 
Matsumura, Masakiyo ; Berkel, Ceesvan ; Uchida, Yasutaka
         
        
            Author_Institution : 
Tokyo Inst. of Technol., Japan
         
        
        
        
        
            fDate : 
12/1/1989 12:00:00 AM
         
        
        
        
            Abstract : 
The device physics of the distributed threshold voltage thin-film transistor is described. This transistor features a low and constant off-current over a wide range of gate voltages. The origin of this feature is investigated using a gradual channel model. It is pointed out, however, that the gradual channel approximation represents a worst-case analysis; there is room for obtaining even better characteristics by taking into account the limit imposed by the generation rate of carriers. The results are applicable not only to amorphous-silicon thin-film transistors, but also to polysilicon thin-film transistors
         
        
            Keywords : 
amorphous semiconductors; elemental semiconductors; insulated gate field effect transistors; semiconductor device models; silicon; thin film transistors; Si thin film transistor; amorphous semiconductor; carrier generation rate; device physics; distributed threshold voltage thin-film transistor; gradual channel approximation; gradual channel model; polysilicon thin-film transistors; Digital TV; Doping; Electrons; FETs; Insulation; Liquid crystal displays; Physics; Thin film transistors; Threshold voltage; Virtual colonoscopy;
         
        
        
            Journal_Title : 
Electron Devices, IEEE Transactions on