• DocumentCode
    1114696
  • Title

    Analysis of distributed threshold voltage transistors

  • Author

    Matsumura, Masakiyo ; Berkel, Ceesvan ; Uchida, Yasutaka

  • Author_Institution
    Tokyo Inst. of Technol., Japan
  • Volume
    36
  • Issue
    12
  • fYear
    1989
  • fDate
    12/1/1989 12:00:00 AM
  • Firstpage
    2965
  • Lastpage
    2970
  • Abstract
    The device physics of the distributed threshold voltage thin-film transistor is described. This transistor features a low and constant off-current over a wide range of gate voltages. The origin of this feature is investigated using a gradual channel model. It is pointed out, however, that the gradual channel approximation represents a worst-case analysis; there is room for obtaining even better characteristics by taking into account the limit imposed by the generation rate of carriers. The results are applicable not only to amorphous-silicon thin-film transistors, but also to polysilicon thin-film transistors
  • Keywords
    amorphous semiconductors; elemental semiconductors; insulated gate field effect transistors; semiconductor device models; silicon; thin film transistors; Si thin film transistor; amorphous semiconductor; carrier generation rate; device physics; distributed threshold voltage thin-film transistor; gradual channel approximation; gradual channel model; polysilicon thin-film transistors; Digital TV; Doping; Electrons; FETs; Insulation; Liquid crystal displays; Physics; Thin film transistors; Threshold voltage; Virtual colonoscopy;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.40964
  • Filename
    40964