DocumentCode
1114696
Title
Analysis of distributed threshold voltage transistors
Author
Matsumura, Masakiyo ; Berkel, Ceesvan ; Uchida, Yasutaka
Author_Institution
Tokyo Inst. of Technol., Japan
Volume
36
Issue
12
fYear
1989
fDate
12/1/1989 12:00:00 AM
Firstpage
2965
Lastpage
2970
Abstract
The device physics of the distributed threshold voltage thin-film transistor is described. This transistor features a low and constant off-current over a wide range of gate voltages. The origin of this feature is investigated using a gradual channel model. It is pointed out, however, that the gradual channel approximation represents a worst-case analysis; there is room for obtaining even better characteristics by taking into account the limit imposed by the generation rate of carriers. The results are applicable not only to amorphous-silicon thin-film transistors, but also to polysilicon thin-film transistors
Keywords
amorphous semiconductors; elemental semiconductors; insulated gate field effect transistors; semiconductor device models; silicon; thin film transistors; Si thin film transistor; amorphous semiconductor; carrier generation rate; device physics; distributed threshold voltage thin-film transistor; gradual channel approximation; gradual channel model; polysilicon thin-film transistors; Digital TV; Doping; Electrons; FETs; Insulation; Liquid crystal displays; Physics; Thin film transistors; Threshold voltage; Virtual colonoscopy;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.40964
Filename
40964
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