DocumentCode
1115648
Title
Very-low-threshold current density 1.29 μm GaInNAs triple quantum well lasers grown by molecular beam epitaxy
Author
Zhao, H. ; Adolfsson, G. ; Wang, S.M. ; Sadeghi, M. ; Larsson, A.
Author_Institution
Chalmers Univ. of Technol., Goteborg
Volume
44
Issue
7
fYear
2008
Firstpage
475
Lastpage
477
Abstract
Very-low-threshold Ga0.62In0.38N0.007As0.993/GaN0.011 As0.989/GaAs triple quantum well (QW) lasers emitting at 1.29 mum are demonstrated. The laser structure was grown by molecular beam epitaxy after extensive optimisations of growth and in situ annealing conditions. As-cleaved broad-area lasers with a cavity length of 1 mm under pulsed operation showed a record low-threshold current density of 400 A/cm2 (~130A/cm2/QW), a high differential efficiency of 0.32 W/A/facet and a characteristic temperature of 94 K in the temperature range 10 to 110degC.
Keywords
molecular beam epitaxial growth; quantum well lasers; molecular beam epitaxy; triple quantum well lasers; very-low-threshold current density;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20080199
Filename
4479552
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