• DocumentCode
    1115648
  • Title

    Very-low-threshold current density 1.29 μm GaInNAs triple quantum well lasers grown by molecular beam epitaxy

  • Author

    Zhao, H. ; Adolfsson, G. ; Wang, S.M. ; Sadeghi, M. ; Larsson, A.

  • Author_Institution
    Chalmers Univ. of Technol., Goteborg
  • Volume
    44
  • Issue
    7
  • fYear
    2008
  • Firstpage
    475
  • Lastpage
    477
  • Abstract
    Very-low-threshold Ga0.62In0.38N0.007As0.993/GaN0.011 As0.989/GaAs triple quantum well (QW) lasers emitting at 1.29 mum are demonstrated. The laser structure was grown by molecular beam epitaxy after extensive optimisations of growth and in situ annealing conditions. As-cleaved broad-area lasers with a cavity length of 1 mm under pulsed operation showed a record low-threshold current density of 400 A/cm2 (~130A/cm2/QW), a high differential efficiency of 0.32 W/A/facet and a characteristic temperature of 94 K in the temperature range 10 to 110degC.
  • Keywords
    molecular beam epitaxial growth; quantum well lasers; molecular beam epitaxy; triple quantum well lasers; very-low-threshold current density;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20080199
  • Filename
    4479552