DocumentCode
1116179
Title
The temperature dependence of breakdown voltage and on-resistance of LDMOS´s
Author
Rofail, Samir S. ; Chaudhry, M. Akhtar
Author_Institution
University of Petroleum and Minerals, Dhahran, Saudi Arabia
Volume
34
Issue
4
fYear
1987
fDate
4/1/1987 12:00:00 AM
Firstpage
933
Lastpage
935
Abstract
The temperature dependence of the breakdown voltage VBD and on-resistance RON of LDMOS devices is studied. The analysis is based on incorporating the temperature-dependent characteristics of the basic physical parameters into existing models to calculate VBD and RON . The effects of temperature on mobility, bandgap, intrinsic concentration, Fermi level, and resistivity of the material are taken into account. Avalanche breakdown is assumed and the partial ionization, at room temperature, of impurity atoms is considered. The contribution of the depletion mode device to RON is assumed to be negligibly small compared with that of the enhancement-mode transistor and the main bulk resistance.
Keywords
Avalanche breakdown; Conductivity; Doping; Equations; Impurities; Ionization; Neodymium; Photonic band gap; Resistors; Temperature dependence;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1987.23019
Filename
1486730
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