• DocumentCode
    1116210
  • Title

    A front-side-illuminated InP/GaInAs/InP p-i-n photodiode with a —3-dB bandwidth in excess of 18GHz

  • Author

    Wang, S.Y. ; Carey, K.W. ; Kolner, B.H.

  • Author_Institution
    Hewlett-Packard Laboratories, Palo Alto, CA
  • Volume
    34
  • Issue
    4
  • fYear
    1987
  • fDate
    4/1/1987 12:00:00 AM
  • Firstpage
    938
  • Lastpage
    940
  • Abstract
    High-speed front-side illuminated InP/GaInAs / InP p-i-n 1-1.6-µm photodetectors have been fabricated from materials grown by atmospheric pressure organometallic vapor phase epitaxy (OMVPE). The AR-coated devices have external quantum efficiencies of > 85 percent at 1.3 µm and the temporal response has a full-width half-maximum (FWHM) of < 18 ps. Dark current density is 6 × 10-6A . cm-2at an operating bias of -4 V. The interface is abrupt to two monolayers at the InP (substrate)-GaInAs heterojunction and five monolayers at the GaInAs-InP p-layer heterojunction.
  • Keywords
    Bandwidth; Bonding; Dark current; Electron devices; Epitaxial growth; Heterojunctions; Indium phosphide; Microwave devices; PIN photodiodes; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23022
  • Filename
    1486733