Title :
A front-side-illuminated InP/GaInAs/InP p-i-n photodiode with a —3-dB bandwidth in excess of 18GHz
Author :
Wang, S.Y. ; Carey, K.W. ; Kolner, B.H.
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, CA
fDate :
4/1/1987 12:00:00 AM
Abstract :
High-speed front-side illuminated InP/GaInAs / InP p-i-n 1-1.6-µm photodetectors have been fabricated from materials grown by atmospheric pressure organometallic vapor phase epitaxy (OMVPE). The AR-coated devices have external quantum efficiencies of > 85 percent at 1.3 µm and the temporal response has a full-width half-maximum (FWHM) of < 18 ps. Dark current density is 6 × 10-6A . cm-2at an operating bias of -4 V. The interface is abrupt to two monolayers at the InP (substrate)-GaInAs heterojunction and five monolayers at the GaInAs-InP p-layer heterojunction.
Keywords :
Bandwidth; Bonding; Dark current; Electron devices; Epitaxial growth; Heterojunctions; Indium phosphide; Microwave devices; PIN photodiodes; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1987.23022