DocumentCode
1116585
Title
A high-power high-gain VD-MOSFET operating at 900 MHz
Author
Ishikawa, Osamu ; Esaki, Hideya
Author_Institution
Matsushita Electric Industrial Co., Ltd., Moriguchi, Osaka, Japan
Volume
34
Issue
5
fYear
1987
fDate
5/1/1987 12:00:00 AM
Firstpage
1157
Lastpage
1162
Abstract
A new vertical double-diffused MOSFET (VD-MOSFET) capable of delivering output power of 100 W at 900 MHz has been developed. It offers the gain of 8 dB and the drain efficiency of 45 percent. The double diffusion self-aligned to the gate allows the devices to control the formation of the submicrometer channel essential for the high transconductance, hence the high gain, with minimum gate-to-source capacitance (Cgs ). The device utilizes MoSi2 for both gate electrodes and shield plates imbedded beneath the CVD oxide in the gate pad region. Low resistivity gate reduces the extra power dissipation to drive the gate, while the shield plate lowers the gate-to-drain capacitance (Cgd ) to half. A maximum output power has been realized by the 12 blocks of VD-MOSFET´s. They are mounted on the two BeO plates packaged with internal input matching circuits, and the power is measured in a push-pull amplifier.
Keywords
Capacitance; Conductivity; Electrodes; Gain; MOSFET circuits; Power MOSFET; Power amplifiers; Power dissipation; Power generation; Transconductance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1987.23058
Filename
1486769
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