• DocumentCode
    1116585
  • Title

    A high-power high-gain VD-MOSFET operating at 900 MHz

  • Author

    Ishikawa, Osamu ; Esaki, Hideya

  • Author_Institution
    Matsushita Electric Industrial Co., Ltd., Moriguchi, Osaka, Japan
  • Volume
    34
  • Issue
    5
  • fYear
    1987
  • fDate
    5/1/1987 12:00:00 AM
  • Firstpage
    1157
  • Lastpage
    1162
  • Abstract
    A new vertical double-diffused MOSFET (VD-MOSFET) capable of delivering output power of 100 W at 900 MHz has been developed. It offers the gain of 8 dB and the drain efficiency of 45 percent. The double diffusion self-aligned to the gate allows the devices to control the formation of the submicrometer channel essential for the high transconductance, hence the high gain, with minimum gate-to-source capacitance (Cgs). The device utilizes MoSi2for both gate electrodes and shield plates imbedded beneath the CVD oxide in the gate pad region. Low resistivity gate reduces the extra power dissipation to drive the gate, while the shield plate lowers the gate-to-drain capacitance (Cgd) to half. A maximum output power has been realized by the 12 blocks of VD-MOSFET´s. They are mounted on the two BeO plates packaged with internal input matching circuits, and the power is measured in a push-pull amplifier.
  • Keywords
    Capacitance; Conductivity; Electrodes; Gain; MOSFET circuits; Power MOSFET; Power amplifiers; Power dissipation; Power generation; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23058
  • Filename
    1486769