• DocumentCode
    1117043
  • Title

    An investigation of i-AlGaAs/n-GaAs doped-channel MIS-like FET´s (DMT´s)—Properties and performance potentialities

  • Author

    Hida, Hikaru ; Okamoto, Akihiko ; Toyoshima, Hideo ; Ohata, Keiichi

  • Author_Institution
    NEC Corporation, Nakagawa, Japan
  • Volume
    34
  • Issue
    7
  • fYear
    1987
  • fDate
    7/1/1987 12:00:00 AM
  • Firstpage
    1448
  • Lastpage
    1455
  • Abstract
    Doped-channel MIS-like FET´s (DMT´s) based upon an i-AlGaAs/n-GaAs structure have been investigated in detail for the purpose of clarifying their properties and performance potentialities. The DMT is unique in having two operation modes, a depletion-layer modulation mode and an electron accumulation mode, both of which are experimentally demonstrated through capacitance-voltage characteristics. Analytical and experimental results shows that the maximum drain current IDSmaxis more than 2.5 times that for a conventional n-AlGaAs/GaAs 2DEGFET. gmmaxand IDsmaxvalues obtained for 0.5- µm gate DMT´s are very high, 310 mS/mm (410 mS/mm) and 650 mA/mm (800 mA,/mm) at 300 K (77 K), respectively, fmaxis 48 GHz. fTis as large as 45 GHz, which is the best data ever reported in 0.5-µm gate FET´s. Moreover, the estimated electron saturation velocity is outstandingly large, 1.5 × 107cm/s (2 × 107cm/s) at 300 K (77 K), even for a thin GaAs channel layer with a 3 × 1018cm-3doping level, while Hall electron mobility is not reasonably so high, being typically 1850 cm2/V . s (1650 cm2/V . S). Preliminary power performances are also studied at 28.5 GHz. An 18-dBm (225-mW/mm) saturation output power, 6.4-dB linear gain, and 15-percent power added efficiency are achieved. A further performance improvement may be easily accomplished by gate length reduction, structure optimization, and so on. Consequently, it has been proved that DMT´s have great feasibility for high-speed and high-frequency high-power device applications.
  • Keywords
    Chemical technology; Doping; Electron mobility; FETs; Gallium arsenide; Leakage current; Molecular beam epitaxial growth; OFDM modulation; Power generation; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23105
  • Filename
    1486816