• DocumentCode
    1117415
  • Title

    Ion-sensing devices with silicon nitride and borosilicate glass insulators

  • Author

    Harame, David L. ; Bousse, Luc J. ; Shott, John D. ; Meindl, James D.

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, NY
  • Volume
    34
  • Issue
    8
  • fYear
    1987
  • fDate
    8/1/1987 12:00:00 AM
  • Firstpage
    1700
  • Lastpage
    1707
  • Abstract
    Ion-sensitive field-effect transistors (ISFET´s) with silicon dioxide, silicon nitride, and borosilicate glass as the active gate material were fabricated and tested for pH-sensing applications. The borosilicate glass and silicon nitride devices were found to have a linear potential/pH response and previous theories of ISFET function were inadequate to explain this. A two-site theory is presented that can explain the features of the potential/pH response of both silicon nitride and borosilicate glass ISFETs. The model is easily extended to any two-site system.
  • Keywords
    Dielectric measurements; Dielectrics and electrical insulation; Electric potential; FETs; Glass; Hydrogen; Insulator testing; Production facilities; Silicon compounds; Surface treatment;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23140
  • Filename
    1486851