DocumentCode
1117415
Title
Ion-sensing devices with silicon nitride and borosilicate glass insulators
Author
Harame, David L. ; Bousse, Luc J. ; Shott, John D. ; Meindl, James D.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume
34
Issue
8
fYear
1987
fDate
8/1/1987 12:00:00 AM
Firstpage
1700
Lastpage
1707
Abstract
Ion-sensitive field-effect transistors (ISFET´s) with silicon dioxide, silicon nitride, and borosilicate glass as the active gate material were fabricated and tested for pH-sensing applications. The borosilicate glass and silicon nitride devices were found to have a linear potential/pH response and previous theories of ISFET function were inadequate to explain this. A two-site theory is presented that can explain the features of the potential/pH response of both silicon nitride and borosilicate glass ISFETs. The model is easily extended to any two-site system.
Keywords
Dielectric measurements; Dielectrics and electrical insulation; Electric potential; FETs; Glass; Hydrogen; Insulator testing; Production facilities; Silicon compounds; Surface treatment;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1987.23140
Filename
1486851
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