• DocumentCode
    1118081
  • Title

    50-Å gate-Oxide MOSFET´s at 77 K

  • Author

    Ong, Tong-Chern ; Ko, Ping K. ; Hu, Chenmig

  • Author_Institution
    University of California, Berkeley, CA
  • Volume
    34
  • Issue
    10
  • fYear
    1987
  • fDate
    10/1/1987 12:00:00 AM
  • Firstpage
    2129
  • Lastpage
    2135
  • Abstract
    While hot-carrier-induced degradation is aggravated at cryogenic temperature, a very thin gate-oxide (52-Å) device can still tolerate a 3-V power-supply voltage at 77 K. Hot-carrier-induced degradation may not be the limiting factor in choosing the power-supply voltage and special drain structures may be necessary for very thin gate MOSFET´s even at 77 K. However, mobility reduction at high VGis more severe both at lower temperatures and for thinner oxides. Electron mobility appears to be oxide-thickness-dependent at 77 K. The dependence of the electron mobility on the normal field is so strong that it results in unusual I-V characteristics such as negative transconductance at 77 K for an oxide field above 3 MV/cm. The I--V characteristics have been modeled with a mobility dependence on VGSof the form µn ∞ (1 + η(VGS- Vt/Tox)2+ (E/Ec))-1for 52-Å devices.
  • Keywords
    Degradation; Doping; Etching; Helium; Hot carriers; Nitrogen; Performance gain; Scattering; Temperature; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23207
  • Filename
    1486918