DocumentCode :
1118081
Title :
50-Å gate-Oxide MOSFET´s at 77 K
Author :
Ong, Tong-Chern ; Ko, Ping K. ; Hu, Chenmig
Author_Institution :
University of California, Berkeley, CA
Volume :
34
Issue :
10
fYear :
1987
fDate :
10/1/1987 12:00:00 AM
Firstpage :
2129
Lastpage :
2135
Abstract :
While hot-carrier-induced degradation is aggravated at cryogenic temperature, a very thin gate-oxide (52-Å) device can still tolerate a 3-V power-supply voltage at 77 K. Hot-carrier-induced degradation may not be the limiting factor in choosing the power-supply voltage and special drain structures may be necessary for very thin gate MOSFET´s even at 77 K. However, mobility reduction at high VGis more severe both at lower temperatures and for thinner oxides. Electron mobility appears to be oxide-thickness-dependent at 77 K. The dependence of the electron mobility on the normal field is so strong that it results in unusual I-V characteristics such as negative transconductance at 77 K for an oxide field above 3 MV/cm. The I--V characteristics have been modeled with a mobility dependence on VGSof the form µn ∞ (1 + η(VGS- Vt/Tox)2+ (E/Ec))-1for 52-Å devices.
Keywords :
Degradation; Doping; Etching; Helium; Hot carriers; Nitrogen; Performance gain; Scattering; Temperature; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1987.23207
Filename :
1486918
Link To Document :
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