• DocumentCode
    1119152
  • Title

    An n-channel BICFET in the InGaAs/InAlGaAs/InAlAs material system

  • Author

    Kiely, P.A. ; Taylor, Geoffrey W. ; Izabelle, A. ; Lebby, M.S. ; Tell, B. ; Brown-Goebeler, K.F. ; Chang, Tao-yuan

  • Author_Institution
    AT&T Bell Lab., Holmdel, NJ, USA
  • Volume
    10
  • Issue
    7
  • fYear
    1989
  • fDate
    7/1/1989 12:00:00 AM
  • Firstpage
    304
  • Lastpage
    306
  • Abstract
    An n-channel BICFET in the InGaAs/InAlGaAs/InAlAs material system with a current gain in a large-area device of greater than 900 is discussed. The device structure utilizes a self-aligned refractory emitter contact and high-temperature processing and still obtains an ideality factor of 1.2 for the source input diode.<>
  • Keywords
    III-V semiconductors; aluminium compounds; field effect transistors; gallium arsenide; heterojunction bipolar transistors; indium compounds; BICFET; HBT; III-V semiconductors; InGaAs-InAlGaAs-InAlAs; bipolar inversion channel FET; current gain; heterojunction material system; high-temperature processing; large-area device; n-channel; self-aligned refractory emitter contact; Conducting materials; Diodes; Etching; FETs; Heterojunctions; Indium compounds; Indium gallium arsenide; Indium phosphide; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.29660
  • Filename
    29660