DocumentCode
1121244
Title
Status of TiOx Antireflective Coating in the United States
Author
Luft, W.
Author_Institution
TRW Systems Redondo Beach, Calif. 90278
Issue
2
fYear
1974
fDate
3/1/1974 12:00:00 AM
Firstpage
185
Lastpage
192
Abstract
The performance of glassed and unglassed Ti0x-coated silicon cells is compared to Si0-coated cells for coating thicknesses from 100 to 200 nm. The experiment was made on cells having initially the same quantum efficiency allowing complete separation of coating induced effects. U.S. cells only showed an adusted improvement of 2.6% for Ti0x-coatings over Si0-coatings as compared to an expected range of 4.8 to 5.5% as based on European investigations. Spectral reflectance analysis showed some destinct differences between the various cell types. This may be related to cell crystal orientation. All cells showed much higher reflectance at the minimum than predicted by theoretical analyses.
Keywords
Coatings; Conductivity; Electric variables measurement; Optical refraction; Photovoltaic cells; Power measurement; Reflectivity; Silicon; Thickness measurement; Wavelength measurement;
fLanguage
English
Journal_Title
Aerospace and Electronic Systems, IEEE Transactions on
Publisher
ieee
ISSN
0018-9251
Type
jour
DOI
10.1109/TAES.1974.307918
Filename
4101192
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