DocumentCode :
1121244
Title :
Status of TiOx Antireflective Coating in the United States
Author :
Luft, W.
Author_Institution :
TRW Systems Redondo Beach, Calif. 90278
Issue :
2
fYear :
1974
fDate :
3/1/1974 12:00:00 AM
Firstpage :
185
Lastpage :
192
Abstract :
The performance of glassed and unglassed Ti0x-coated silicon cells is compared to Si0-coated cells for coating thicknesses from 100 to 200 nm. The experiment was made on cells having initially the same quantum efficiency allowing complete separation of coating induced effects. U.S. cells only showed an adusted improvement of 2.6% for Ti0x-coatings over Si0-coatings as compared to an expected range of 4.8 to 5.5% as based on European investigations. Spectral reflectance analysis showed some destinct differences between the various cell types. This may be related to cell crystal orientation. All cells showed much higher reflectance at the minimum than predicted by theoretical analyses.
Keywords :
Coatings; Conductivity; Electric variables measurement; Optical refraction; Photovoltaic cells; Power measurement; Reflectivity; Silicon; Thickness measurement; Wavelength measurement;
fLanguage :
English
Journal_Title :
Aerospace and Electronic Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9251
Type :
jour
DOI :
10.1109/TAES.1974.307918
Filename :
4101192
Link To Document :
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