• DocumentCode
    1121244
  • Title

    Status of TiOx Antireflective Coating in the United States

  • Author

    Luft, W.

  • Author_Institution
    TRW Systems Redondo Beach, Calif. 90278
  • Issue
    2
  • fYear
    1974
  • fDate
    3/1/1974 12:00:00 AM
  • Firstpage
    185
  • Lastpage
    192
  • Abstract
    The performance of glassed and unglassed Ti0x-coated silicon cells is compared to Si0-coated cells for coating thicknesses from 100 to 200 nm. The experiment was made on cells having initially the same quantum efficiency allowing complete separation of coating induced effects. U.S. cells only showed an adusted improvement of 2.6% for Ti0x-coatings over Si0-coatings as compared to an expected range of 4.8 to 5.5% as based on European investigations. Spectral reflectance analysis showed some destinct differences between the various cell types. This may be related to cell crystal orientation. All cells showed much higher reflectance at the minimum than predicted by theoretical analyses.
  • Keywords
    Coatings; Conductivity; Electric variables measurement; Optical refraction; Photovoltaic cells; Power measurement; Reflectivity; Silicon; Thickness measurement; Wavelength measurement;
  • fLanguage
    English
  • Journal_Title
    Aerospace and Electronic Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9251
  • Type

    jour

  • DOI
    10.1109/TAES.1974.307918
  • Filename
    4101192