DocumentCode :
1121252
Title :
HEMT with nonalloyed ohmic contacts using n+-InGaAs cap layer
Author :
Kuroda, Shigeru ; Harada, Naoki ; Katakami, T. ; Mimura, Takashi
Author_Institution :
Fujitsu Laboratories Ltd., Atsugi, Japan
Volume :
8
Issue :
9
fYear :
1987
fDate :
9/1/1987 12:00:00 AM
Firstpage :
389
Lastpage :
391
Abstract :
We have investigated nonalloyed ohmic contacts on HEMT´s using a highly conductive n+-InGaAs layer. The minimum specific contact resistance obtained was 4.8 × 10-7Ω.cm2, and the IV characteristics were equal to or better than those of conventional HEMT´s with alloyed ohmic contacts. The maximum transconductances of a nonalloyed ohmic HEMT were 240 mS/mm at 300K and 340 mS/mm at 88K for a gate length of 1.1 µm. We conclude that it is not necessary for HEMT´s with two-dimensional electron gas (2DEG) channels to have alloyed ohmic contacts, because the tunneling conduction is significant at the n-GaAs/n-AlGaAs/undoped GaAs double heterojunction.
Keywords :
Contact resistance; Electrons; Gallium arsenide; HEMTs; Heterojunctions; Ohmic contacts; Substrates; Surface morphology; Temperature; Wet etching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26670
Filename :
1487220
Link To Document :
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