DocumentCode :
1121776
Title :
Anomalous subthreshold current—Voltage characteristics of n-channel SOI MOSFET´s
Author :
Fossum, Jerry G. ; Sundaresan, R. ; Matloubian, Mishel
Author_Institution :
University of Florida, Gainesville, FL
Volume :
8
Issue :
11
fYear :
1987
fDate :
11/1/1987 12:00:00 AM
Firstpage :
544
Lastpage :
546
Abstract :
The abnormally high slopes of the subthreshold current-voltage characteristics exhibited by n-channel silicon-on-insulator (SOI) MOSFET´s are experimentally related to defect density (off-state leakage current) as well as drain voltage and channel length, and a theoretical physical description of the measured relations is presented and supported. The anomalous subthreshold behavior is attributed analytically to the (floating) body effect due to charging (biasing) by impact ionization at the drain.
Keywords :
CMOS technology; Current measurement; Density measurement; Impact ionization; Leakage current; Length measurement; MOSFETs; Semiconductor films; Silicon on insulator technology; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26722
Filename :
1487272
Link To Document :
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