Title :
Bias-sputtered Nb for reliable wirings in Josephson circuits
Author :
Imamura, T. ; Ohara, S. ; Hasuo, S.
Author_Institution :
Fujitsu Lab. Ltd., Atsugi, Japan
fDate :
3/1/1991 12:00:00 AM
Abstract :
Bias-sputtered Nb films were applied to wirings in Josephson circuits. Applying bias voltage during sputtering improved Nb step coverage and stability against annealing. Deteriorated superconducting characteristics in films were negligible for bias voltage less than -150 V. The characteristics of contacts formed between two Nb wirings were studied. By using bias-sputtered Nb as the upper wiring, the I c of the contacts increased 2-10 times. Reduction in contact Ic after annealing was markedly suppressed. The authors verified that the bias-sputtered Nb was feasible in Josephson circuits as reliable wirings, with no compromise of junction characteristics
Keywords :
metallisation; niobium; sputtered coatings; superconducting integrated circuits; superconducting junction devices; -150 to -300 V; Josephson circuits; Nb step coverage; bias voltage during sputtering; bias-sputtered Nb; characteristics of contacts; junction characteristics; reliable wirings; stability against annealing; superconducting characteristics; Annealing; Argon; Integrated circuit reliability; Niobium; Sputtering; Superconducting films; Surface morphology; Tensile stress; Voltage; Wiring;
Journal_Title :
Magnetics, IEEE Transactions on