DocumentCode
1122070
Title
Characteristics of High-
Josephson Junction Fabricated by Focused Ion Beam and Ion Damage
Author
Wu, Chiu-Hsien ; Kuo, Wei-Cheng ; Chou, Yu-Te ; Chen, Jau-Han ; Yang, Hong-Chang
Author_Institution
Dept. of Phys., Nat. Chung Hsing Univ., Taichung, Taiwan
Volume
19
Issue
3
fYear
2009
fDate
6/1/2009 12:00:00 AM
Firstpage
210
Lastpage
213
Abstract
A high-Tc Josephson junction and superconducting quantum interference devices (SQUIDs) were fabricated by focused ion beam (FIB) milling and 150 keV oxygen ion implantation. A single layer gold mask with a small aperture of 28-73 nm defined by direct milling with FIB, was used. The voltage versus current characteristics of high-Tc YBa2Cu3O7-x Josephson junctions were measured under microwaves. Shapiro steps were observed in the single junction. The voltage versus current and voltage versus magnetic field characteristics of a SQUID were measured.
Keywords
SQUIDs; barium compounds; focused ion beam technology; high-temperature superconductors; ion implantation; yttrium compounds; Shapiro steps; YBa2Cu3O7-x; focused ion beam milling; high- Tc Josephson junction; ion implantation; superconducting quantum interference devices; Focused ion beam; Josephson junction; SQUID; ion implantation;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/TASC.2009.2018366
Filename
5153032
Link To Document