DocumentCode
1122850
Title
Self-Assembled Nanotiles of Heteroepitaxial SiC on Si
Author
Matsumoto, T. ; Kiuchi, M. ; Sugimoto, S. ; Goto, S.
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol., Osaka
Volume
34
Issue
4
fYear
2006
Firstpage
1109
Lastpage
1111
Abstract
Using an organometallic ion-beam deposition technique, self-assembled silicon carbide (SiC) nanotiles were fabricated on Si wafers. Nanosized semiconducting tiles are important in electronics and photonics technologies and will be applicable for single-electron and microlight-emitting devices. The SiC is a wide bandgap semiconductor used for UV light emitters and power devices. While many fabrication trials have been performed for silicon and germanium nanodots, to the authors´ knowledge, no prior reports of a heteroepitaxial growth of SiC nanodots or nanotiles have been made
Keywords
atomic force microscopy; ion beam assisted deposition; nanostructured materials; reflection high energy electron diffraction; self-assembly; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; silicon compounds; surface morphology; vapour phase epitaxial growth; wide band gap semiconductors; Si; SiC; atomic force microscopy; heteroepitaxial growth; nanosized semiconducting tiles; organometallic ion-beam deposition; reflection high-energy electron diffraction; self-assembled silicon carbide nanotiles; silicon carbide nanodots; silicon wafer; surface morphology; surface structure; wide bandgap semiconductor; Fabrication; Germanium; Light emitting diodes; Nanoscale devices; Photonics; Self-assembly; Semiconductivity; Silicon carbide; Wide band gap semiconductors; Atomic force microscopy (AFM); ion-beam applications; nanotechnology; self-organizing control; semiconductor films; silicon compounds; surfaces;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2006.877643
Filename
1673492
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