Title :
Time-Resolved Ion and Electron Current Measurements in Pulsed Plasma Sheaths
Author :
Bradley, Michael P. ; Steenkamp, Casper J T
Author_Institution :
Phys. & Eng. Phys. Dept., Saskatchewan Univ., Saskatoon, Sask.
Abstract :
In this paper, time-resolved Langmuir-probe measurements of both electron and ion currents in the transient sheath region adjacent to a plasma ion implantation target pulsed to negative high voltages are reported. A fast (i.e., greater than the ion-acoustic speed) initial sheath expansion is observed followed by a slower propagation at the ion-acoustic speed into the bulk plasma. It has been observed that the ion density exhibits perturbation near the ion plasma frequency several microseconds prior to its depletion
Keywords :
Langmuir probes; plasma density; plasma immersion ion implantation; plasma ion acoustic waves; plasma sheaths; plasma transport processes; Langmuir probe; electron current measurements; ion current measurements; ion density; ion plasma frequency; ion-acoustic speed; plasma ion implantation target; pulsed plasma sheaths; Current measurement; Electrons; Frequency; Ion implantation; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Pulse measurements; Voltage; Ion-acoustic speed; ion plasma frequency; plasma ion implantation (PII); transient sheath;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2006.877744