• DocumentCode
    1123236
  • Title

    Bacterial Inactivation Using an RF-Powered Atmospheric Pressure Plasma

  • Author

    Sharma, Ashish ; Pruden, Amy ; Stan, Ovidiu ; Collins, George J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO
  • Volume
    34
  • Issue
    4
  • fYear
    2006
  • Firstpage
    1290
  • Lastpage
    1296
  • Abstract
    Cells of Escherichia coli were exposed to a downstream plasma afterglow plume emitted from a slotted plasma device operating in open air at atmospheric pressure. Various feed-gas mixtures were capacitively excited, as they flowed into open air past radio frequency-powered electrodes. To estimate the underlying inactivation pathways, various experimental conditions were tested by incorporating ultraviolet filters, varying parameters such as electrical power and frequency, feed-gas composition and flow rates, and the distance of the samples from the electrode. Experimental results demonstrated a colony-forming unit reduction of well over five logs with less than 2 s of exposure per unit area. These results offer a promising means of wide-area inactivation of harmful microbes in a practical environment, where the sample is neither a part of the electrical circuit nor placed in an enclosure. The device is electrically grounded and could be held like a wand applicator
  • Keywords
    afterglows; biological techniques; cellular effects of radiation; microorganisms; plasma applications; Escherichia coli cells; RF-powered atmospheric pressure plasma; bacterial inactivation; colony-forming unit reduction; down-stream plasma afterglow plume; electrical power; electrode; feed-gas composition; feed-gas mixtures; flow rates; harmful microbes; slotted plasma device; ultraviolet filters; Applicators; Atmospheric-pressure plasmas; Circuits; Electrodes; Filters; Frequency estimation; Microorganisms; Plasma devices; Radio frequency; Testing; Atmospheric pressure plasmas; radio-frequency (RF); sterilization;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2006.878377
  • Filename
    1673527