Analytical and Experimental Dosimetry of a Cell Culture in T-25 Flask Housed in a Thermally Controlled Waveguide

Author

Gerber, Howard L. ; Bassi, Ashish ; Khalid, Muhammad Hassan ; Zhou, Chenn Q. ; Wang, San Ming ; Tseng, Charles C.

Author_Institution

Dept. of Electr. & Comput. Eng., Purdue Univ., Hammond, IN

Volume

34

Issue

4

fYear

2006

Firstpage

1449

Lastpage

1454

Abstract

This paper describes the dosimetry of a 2.45-GHz thermally controlled waveguide exposure system containing a T-25 cell culture flask used for gene expression studies. The bottom surface of the flask is maintained at 37 degC while the remaining surfaces of the flask are at a lower temperature determined by air convection currents. Thermal gradients are set up in the cell culture medium that creates convection currents that affect cell position and exposure. The finite-element commercial software high-frequency structure simulator (HFSS) by Ansoft Corporation is used to analyze the three-dimensional distribution of electric field. The data from HFSS are exported to the finite element computational fluid dynamics (CFD) software FLUENT. The results from HFSS and CFD software agree with experimental data

Keywords

bioelectric phenomena; cellular biophysics; computational fluid dynamics; convection; dosimetry; finite element analysis; waveguides; 2.45 GHz; 37 degC; T-25 flask; air convection currents; cell culture; cell position; computational fluid dynamics software FLUENT; dosimetry; finite-element commercial software high-frequency structure simulator; gene expression; thermal gradients; thermally controlled waveguide exposure system; three-dimensional electric field distribution; Analytical models; Computational fluid dynamics; Computational modeling; Control systems; Dosimetry; Finite element methods; Gene expression; Plasma temperature; Radio frequency; Surface waves; Cell suspension electric field distribution; RF dosimetry; coupled radio frequency (RF) and computational fluid dynamics (CFD) analysis; nonthermal RF exposure;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2006.876499

Filename

1673550