• DocumentCode
    1124103
  • Title

    Trade-offs and challenges of short channel design on millimetre-wave power performance of GaN HFETs

  • Author

    Sun, Y. ; Eastman, L.F.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Cornell Univ., Ithaca, USA
  • Volume
    41
  • Issue
    15
  • fYear
    2005
  • fDate
    7/21/2005 12:00:00 AM
  • Firstpage
    854
  • Lastpage
    855
  • Abstract
    For the application of undoped AlGaN/GaN HFETs to Ka-band millimetre(mm)-wave high frequency power performance, the maximum frequency of oscillation, fmax, was found to be seriously limited by gate resistance and output conductance with the gate length down to 0.1 μm. This makes it difficult for devices to achieve both high fT and fmax at the same time. However, the technology of field-plate gate, to increase device breakdown voltage, will add extra gate capacitance. It makes the optimum gate structure design more important. The influence of gate metal thickness and gate length on fmax based on the lumped small signal circuit model analysis and the possibility to obtain high fT and fmax simultaneously for the GaN material structure is discussed for application to the Ka-band mm-wave operating system.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; junction gate field effect transistors; millimetre wave field effect transistors; millimetre wave power transistors; semiconductor device breakdown; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; Ka band; device breakdown voltage; field-plate gate; gate capacitance; gate length; gate metal thickness; gate resistance; gate structure design; high frequency power performance; material structure; millimeter wave HFET; oscillation frequency; short channel design; signal circuit model analysis;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20051640
  • Filename
    1487747