DocumentCode :
1124221
Title :
Fabrication of Tantalum Sheet for Superconductor Diffusion Barriers
Author :
Balachandran, Shreyas ; Hartwig, Karl T. ; Baars, Derek C. ; Mathaudhu, Suveen N. ; Bieler, Thomas R. ; Pyon, Tae ; Barber, Robert E.
Author_Institution :
Dept. of Mech. Eng., Texas A&M Univ., College Station, TX, USA
Volume :
19
Issue :
3
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
2606
Lastpage :
2609
Abstract :
Poor deformation behavior of commercial Ta sheet used for Sn diffusion barriers in multifilamentary Nb3Sn superconductors leads to excessive Ta-Cu interface roughening and the use of a thick Ta layer to overcome layer fracture. The problem stems from three factors: Ta strain hardens faster and to a much higher flow stress than Cu, pure Cu is adjacent to Ta, and the Ta sheet microstructure is non-uniform and non-optimum. The objective of our work is to fabricate Ta sheet with improved deformation behavior over present day commercial Ta sheet. The hypothesis is that a uniform, fine-grained, and well-textured sheet with a preferred orientation will have better codeformation characteristics. To test this thinking, 25 mm square cross-section bars of Ta were deformed by equal channel angular extrusion (ECAE) to strains of nine, sliced in half, annealed to various levels, and rolled to 0.5 mm thick sheet, and Cu-Ta monofilaments fabricated with the processed sheet. Experimental results and roughness measurements on the Ta layers indicate that severe plastic deformation (SPD) processed sheet shows better characteristics than commercial Ta layers. This results from the uniform microstructure and fine grains in precursor Ta sheet processed by SPD.
Keywords :
annealing; copper; diffusion barriers; extrusion; interface roughness; plastic flow; rolling; sheet materials; tantalum; texture; work hardening; Cu-Ta; ECAE; annealing; equal channel angular extrusion; fine-grained sheet; flow stress; interface roughness; multifilamentary Nb3Sn superconductors; preferred orientation; rolling; severe plastic deformation; sheet microstructure; strain hardening; superconductor diffusion barrier; tantalum bars; tantalum sheet; well-textured sheet; Codeformation; ECAE; diffusion barriers; fine grains and tantalum; uniform microstructure;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2009.2018153
Filename :
5153239
Link To Document :
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