Title :
Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser
Author :
Dyer, P.E. ; Farley, R.J. ; Giedl, R. ; Byron, K.C.
Author_Institution :
Dept. of Appl. Phys., Hull Univ.
fDate :
7/7/1994 12:00:00 AM
Abstract :
The reflectivity of weak in-fibre gratings (a few percent reflectivity) written by an ArF laser illuminated phase mask can be dramatically enhanced (reaching ⩾95%) by subsequent exposure using a uniform ArF laser beam. This new effect offers the possibility of post-writing control of grating properties
Keywords :
diffraction gratings; laser beam applications; optical fibres; optical workshop techniques; reflectivity; 193 nm; ArF; amplification; fibre Bragg grating reflectivity; grating properties; in-fibre gratings; laser illuminated phase mask; post-writing control; post-writing exposure; uniform ArF laser beam;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19940780
