DocumentCode :
1124876
Title :
Retention Performance of Ferroelectric Polymer Film for Nonvolatile Memory Devices
Author :
Kim, Woo Young ; Ka, Du Youn ; Cho, Byeongok ; Kim, Sang Youl ; Lee, Yong Soo ; Lee, Hee Chul
Author_Institution :
Div. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume :
30
Issue :
8
fYear :
2009
Firstpage :
822
Lastpage :
824
Abstract :
For nonvolatile memory devices, capacitors with metal-ferroelectric-metal structures were fabricated using poly(vinylidene fluoride-trifluoroethylene) as a ferroelectric layer, and performance was estimated in terms of retention property. In the same thickness, the polarization retained longer as the writing pulsewidth (PW) was extended. With the same writing PW, a thicker capacitor maintained a polarized state longer. In conclusion, the performance for operating voltage, operating frequency, and data retention time is expected.
Keywords :
MIM devices; capacitors; dielectric polarisation; dielectric thin films; ferroelectric capacitors; ferroelectric materials; polymer films; random-access storage; thin film capacitors; capacitors; data retention time; ferroelectric polymer film; metal-ferroelectric-metal structures; nonvolatile memory devices; operating frequency; operating voltage; polarization; poly(vinylidene fluoride-trifluoroethylene); writing pulsewidth; Depolarization; ferroelectric; hysteresis; low voltage; metal–ferroelectric–metal (MFM) structure; retention; writing pulsewidth (PW);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2022961
Filename :
5153298
Link To Document :
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