Title :
Surface decontamination of simulated chemical warfare agents using a nonequilibrium plasma with off-gas monitoring
Author :
Moeller, Trevor M. ; Alexander, Michael L. ; Engelhard, Mark H. ; Gaspar, Daniel J. ; Luna, Maria L. ; Irving, Patricia M.
Author_Institution :
InnovaTek Inc., Richland, WA, USA
fDate :
8/1/2002 12:00:00 AM
Abstract :
InnovaTek, Inc., Richland, WA, is developing a surface decontamination technology that utilizes active species generated in a nonequilibrium corona plasma. The plasma technology was tested against dimethyl-methyl phosphonate (DMMP), a simulant for the chemical agent Sarin. Gas chromatograph mass spectrometry analysis showed that a greater than four log10 destruction of the DMMP on an aluminum surface was achieved in a 10-min treatment. An ion-trap mass spectrometer was utilized to collect time-resolved data on the treatment off-gases. These data indicate that only nontoxic fragments of the broken down DMMP molecule were present in the gas phase. The technology is being further refined to develop a product that will not only decontaminate surfaces but that will also sense when decontamination is complete.
Keywords :
chromatography; corona; mass spectroscopic chemical analysis; plasma chemistry; plasma materials processing; plasma-wall interactions; surface cleaning; weapons; 10 min; Sarin; active species generation; aluminum surface; atmospheric air-plasma discharge; chemical agent; decontamination completion; dimethyl-methyl phosphonate; gas chromatograph mass spectrometry analysis; ion-trap mass spectrometer; ion-trap mass spectrometry; near-realtime decontamination system; nonequilibrium corona plasma; nonequilibrium plasma; nonthermal plasma; nontoxic fragments; off-gas monitoring; off-gases; plasma flare; simulant; simulated chemical warfare agents; surface decontamination technology; toxic byproducts; treatment time; Aluminum; Chemical technology; Corona; Decontamination; Mass spectroscopy; Monitoring; Plasma chemistry; Plasma simulation; Surface treatment; Testing;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2002.804197