DocumentCode :
1126954
Title :
Chemical warfare agent decontamination studies in the plasma decon chamber
Author :
Herrmann, Hans W. ; Selwyn, Gary S. ; Henins, Ivars ; Park, Jaeyoung ; Jeffery, Mark ; Williams, John M.
Author_Institution :
Los Alamos Nat. Lab., NM, USA
Volume :
30
Issue :
4
fYear :
2002
fDate :
8/1/2002 12:00:00 AM
Firstpage :
1460
Lastpage :
1470
Abstract :
A "plasma decon chamber" has been developed at Los Alamos National Laboratory (LANL), Albuquerque, NM, to study the decontamination of chemical and biological warfare agents. This technology is targeted at sensitive electronic equipment for which there is currently no acceptable, nondestructive means of decontamination. Chemical reactivity is provided by a downstream flux of reactive radicals such as atomic oxygen and atomic hydrogen, produced in a capacitively coupled plasma. In addition, the decon chamber provides an environment that accelerates the evaporation of chemical agents from contaminated surfaces by vacuum, heat, and forced convection. Once evaporated, agents and agent byproducts are recirculated directly through the plasma, where they undergo further chemical breakdown. Preliminary studies on actual chemical agents were conducted at the U.S. Army Dugway Proving Ground, Dugway, UT. Exposures were conducted at a system pressure of 30 torr, exposure temperature of 70°C, plasma-to-sample standoff distance of 10 cm, and 10% addition of oxygen or hydrogen to a helium balance. This exposure condition was based on optimization studies conducted at LANL on agent simulants. The agents studied were VX and soman (GD) nerve agents and sulfur mustard (HD) blister agent, as well as a thickened simulant. All agents were decontaminated off aluminum substrates to below the detection limit of ∼0.1% of the initial contamination level of approximately 1 mg/cm2. For VX, this level of decontamination was achieved in 8-16 min of exposure, while only 2 min were required for the more volatile HD and GD. Evaporation and subsequent gas-phase chemical breakdown in the plasma appears to be the dominant decontamination mechanism for all of the agents. However, an observed difference in the decontamination process between oxygen and hydrogen indicates that chemical reactivity in the liquid phase also plays an important role.
Keywords :
plasma chemistry; plasma materials processing; plasma-wall interactions; surface cleaning; weapons; Los Alamos National Laboratory; VX; agent byproducts recirculation; aluminum substrates; atomic hydrogen; atomic oxygen; biological warfare agents; capacitively coupled plasma; chemical agents; chemical reactivity; chemical warfare agent decontamination; contaminated surfaces; detection limit; downstream flux; electronic equipment; evaporation; exposure temperature; forced convection; gas-phase chemical breakdown; heat; helium balance; hydrogen; initial contamination level; nerve agents; nondestructive decontamination; optimization; oxygen; plasma decon chamber; plasma-to-sample standoff distance; reactive radicals; soman; sterilization; sulfur mustard blister agent; system pressure; thickened simulant; vacuum; Atomic measurements; Chemicals; Decontamination; Electric breakdown; High definition video; Hydrogen; Laboratories; Plasma accelerators; Plasma chemistry; Plasma temperature;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2002.804196
Filename :
1167641
Link To Document :
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