DocumentCode :
1127295
Title :
The structure of SiO2, its defects and radiation hardness
Author :
Devine, Roderick A B
Author_Institution :
CNET, Meylan, France
Volume :
41
Issue :
3
fYear :
1994
fDate :
6/1/1994 12:00:00 AM
Firstpage :
452
Lastpage :
459
Abstract :
We review our understanding of the structure of amorphous SiO2 and the role of processing in inducing defect precursors. Five potential sources of positive trapped oxide charge and two of negative trapped charge are described. The most studied of these is the positively charged oxygen-vacancy center. Ionizing radiation is found to be ~1000 times less efficient than particle radiation in creating this defect. Various processing induced precursors of the defect and their transformation by radiation are discussed in detail. Macroscopic structural modifications induced by very large radiation doses (109 rad) are also discussed. Ionizing radiation is also found to be ~1000 times less efficient than particle radiation in inducing these modifications
Keywords :
noncrystalline state structure; radiation effects; radiation hardening (electronics); silicon compounds; vacancies (crystal); 10E9 rad; SiO2; amorphous SiO2; defects; ionizing radiation; negative trapped charge; oxygen-vacancy center; positive trapped oxide charge; radiation dose; radiation hardness; structure; Amorphous materials; Atmosphere; Bonding; Crystallization; Energy measurement; Goniometers; Nuclear magnetic resonance; Nuclear measurements; Oxidation; X-rays;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.299784
Filename :
299784
Link To Document :
بازگشت