DocumentCode :
1127713
Title :
A new model of switching operation in fully depleted ultrathin-film CMOS/SIMOX
Author :
Omura, Yasuhisa ; Izumi, Katsutoshi
Author_Institution :
NTT LSI Labs., Atsugi, Japan
Volume :
12
Issue :
12
fYear :
1991
Firstpage :
655
Lastpage :
657
Abstract :
An analysis is made of the switching performances of fabricated ultrathin-film submicrometer-gate CMOS/SIMOX ring oscillators. A time-dependent gate capacitance model is proposed to explain the switching operation mechanism. It is found that reducing the gate capacitance by full depletion of the body silicon dramatically improves the propagation delay time of CMOS/SIMOX.<>
Keywords :
CMOS integrated circuits; digital integrated circuits; integrated circuit technology; oscillators; semiconductor device models; semiconductor-insulator boundaries; CMOS/SIMOX; full depletion; fully depleted; gate capacitance reduction; gate propagation delay; propagation delay time; ring oscillators; submicrometer-gate; switching operation mechanism; switching performances; time-dependent gate capacitance model; ultrathin-film; Capacitance; Electron mobility; MOS devices; Performance analysis; Predictive models; Propagation delay; Ring oscillators; Semiconductor device modeling; Silicon; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.116945
Filename :
116945
Link To Document :
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