DocumentCode
1128448
Title
PCVD: A technique suitable for large-scale fabrication of optical fibers
Author
Lydtin, Hans
Author_Institution
Philips Research Laboratories, Aachen, West Germany
Volume
4
Issue
8
fYear
1986
fDate
8/1/1986 12:00:00 AM
Firstpage
1034
Lastpage
1038
Abstract
This paper reviews the ´state of the art´ of plasma activated chemical vapor deposition (PCVD) as a manufacturing technique for high-quality optical fibers. It includes a compilation of the features inherent to PCVD, a presentation of recent results with respect to the optical properties, and the reproducibility as well as productivity and a discussion on future aspects of PCVD.
Keywords
Optical fiber materials/fabrication; Plasma applications, materials processing; Chemical vapor deposition; Large-scale systems; Optical device fabrication; Optical fibers; Plasma chemistry; Plasma materials processing; Plasma properties; Productivity; Pulp manufacturing; Reproducibility of results;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.1986.1074872
Filename
1074872
Link To Document