Title :
Ion implanted integrated optics (I3O) technology for planar lightwave circuits fabrication
Author :
Drouard, Emmanuel ; Escoubas, Ludovic ; Flory, François ; Tisserand, Stéphane ; Roux, Laurent
Abstract :
The Ion Implanted Integrated Optics (I3O) technology, using titanium ion implantation in bulk silica to fabricate passive compact planar lightwave circuits (PLCs), is presented in this paper. Its advantages are described and compared with other waveguide fabrication technologies. It is demonstrated that the guided electromagnetic field can be tailored by adjusting the titanium ion dose either to fit the guided mode of standard single-mode fibers or to allow a sharp radius of curvature of bent waveguides.
Keywords :
ion implantation; optical fabrication; optical planar waveguides; titanium; I3O technology; Ti; bent waveguides; ion implanted integrated optics; planar lightwave circuits fabrication; titanium ion implantation; Electromagnetic fields; Electromagnetic waveguides; Integrated circuit technology; Integrated optics; Ion implantation; Optical device fabrication; Optical waveguides; Programmable control; Silicon compounds; Titanium; Bent waveguide; fiber coupling; integrated optics; ion implantation; passive integrated circuits;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2004.833285
