Title :
A novel MCVD process control technique
Author :
Smithgall, David H. ; Miller, T.J. ; Frazee, Ralph E., Jr.
Author_Institution :
AT&T Technologies, Engineering Research Center, Princeton, NJ, USA
fDate :
9/1/1986 12:00:00 AM
Abstract :
A new technique for measuring and controlling the sintering zone in the MCVD process is described. The method results in uniform internal processing conditions over a wide range of deposition conditions.
Keywords :
Optical fiber materials/fabrication; Process control; Chemical processes; Equations; Fires; Fluid flow; Glass; Optical control; Process control; Silicon compounds; Temperature control; Temperature measurement;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.1986.1074892
