DocumentCode :
1129219
Title :
Electrical transient study of negative resistance in SOI MOS transistors
Author :
Le Neel, Olivier ; Haond, M.
Author_Institution :
CNET, Meylan, France
Volume :
26
Issue :
1
fYear :
1990
Firstpage :
73
Lastpage :
74
Abstract :
Using electrical transients the authors have investigated the negative resistance observed in the output characteristics at high gate voltages in MOS transistors made in SOI films. They show experimentally that this effect is due to a temperature rise in the device itself. This results from the poor thermal conductivity of the buried oxide of the SOI structure.
Keywords :
insulated gate field effect transistors; negative resistance effects; semiconductor device models; semiconductor-insulator boundaries; MOSFETs; SOI MOS transistors; SOI films; buried oxide; electrical transients; high gate voltages; negative resistance; output characteristics; poor thermal conductivity; temperature rise; thermal modelling;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19900048
Filename :
44884
Link To Document :
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