DocumentCode
1129219
Title
Electrical transient study of negative resistance in SOI MOS transistors
Author
Le Neel, Olivier ; Haond, M.
Author_Institution
CNET, Meylan, France
Volume
26
Issue
1
fYear
1990
Firstpage
73
Lastpage
74
Abstract
Using electrical transients the authors have investigated the negative resistance observed in the output characteristics at high gate voltages in MOS transistors made in SOI films. They show experimentally that this effect is due to a temperature rise in the device itself. This results from the poor thermal conductivity of the buried oxide of the SOI structure.
Keywords
insulated gate field effect transistors; negative resistance effects; semiconductor device models; semiconductor-insulator boundaries; MOSFETs; SOI MOS transistors; SOI films; buried oxide; electrical transients; high gate voltages; negative resistance; output characteristics; poor thermal conductivity; temperature rise; thermal modelling;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19900048
Filename
44884
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