• DocumentCode
    1129219
  • Title

    Electrical transient study of negative resistance in SOI MOS transistors

  • Author

    Le Neel, Olivier ; Haond, M.

  • Author_Institution
    CNET, Meylan, France
  • Volume
    26
  • Issue
    1
  • fYear
    1990
  • Firstpage
    73
  • Lastpage
    74
  • Abstract
    Using electrical transients the authors have investigated the negative resistance observed in the output characteristics at high gate voltages in MOS transistors made in SOI films. They show experimentally that this effect is due to a temperature rise in the device itself. This results from the poor thermal conductivity of the buried oxide of the SOI structure.
  • Keywords
    insulated gate field effect transistors; negative resistance effects; semiconductor device models; semiconductor-insulator boundaries; MOSFETs; SOI MOS transistors; SOI films; buried oxide; electrical transients; high gate voltages; negative resistance; output characteristics; poor thermal conductivity; temperature rise; thermal modelling;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19900048
  • Filename
    44884