DocumentCode :
1129892
Title :
Static Friction in Polysilicon Surface Micromachines
Author :
Lumbantobing, Ari ; Komvopoulos, Kyriakos
Author_Institution :
Dept. of Mech. Eng., Univ. of California, Berkeley, CA, USA
Volume :
14
Issue :
4
fYear :
2005
Firstpage :
651
Lastpage :
663
Abstract :
Surface micromachines of polycrystalline silicon were used to investigate the dependence of static friction in microelectromechanical systems on the external load, apparent contact area, and environmental conditions. An analytical model of the micromachine at the inception of sliding was used to determine the normal load consisting of the restoring and levitation forces exerted by the micromachine\´s comb-drive actuators. The apparent shear strength at the contact interface(s) exhibited a nonlinear dependence on the apparent contact pressure. Relatively higher static coefficient of friction and interfacial shear strength were obtained in room air than vacuum ambient. The static coefficient of friction was found to depend on the normal load, apparent contact area, and ambient conditions (i.e., relative humidity). Electrical contact resistance measurements indicated that sliding in room air promoted thickening of the native oxide film at asperity contacts. The experimental evidence suggests that modification of the surface topography occurred at the asperity level. However, these submicroscopic changes in the surface topography did not affect the overall static friction behavior, for the test cycles simulated in the friction experiments. \\hfill \\hbox {[1225]}
Keywords :
micromechanical devices; shear strength; silicon; sliding friction; stiction; surface topography; analytical model; asperity contacts; comb-drive actuators; contact interface; contact pressure; electrical contact resistance measurements; interfacial shear strength; levitation forces; micro-electromechanical systems; oxide film; polycrystalline silicon; polysilicon surface micromachines; relative humidity; static friction; submicroscopic changes; surface topography; Actuators; Analytical models; Contacts; Friction; Humidity; Levitation; Microelectromechanical systems; Silicon; Surface resistance; Surface topography; Contact interfaces; contact pressure; microelectromechanical devices; oxide film; polycrystalline silicon; relative humidity; static friction;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2005.850719
Filename :
1492416
Link To Document :
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