Title :
Bandwidth engineering of photonic crystal waveguide bends
Author :
Borel, P.I. ; Frandsen, L.H. ; Harpth, A. ; Leon, J.B. ; Liu, H. ; Kristensen, M. ; Bogaerts, W. ; Dumon, P. ; Baets, R. ; Wiaux, V. ; Wouters, J. ; Beckx, S.
Author_Institution :
Res. Center COM, Tech. Univ. of Denmark, Lyngby, Denmark
Abstract :
An effective design principle has been applied to photonic crystal waveguide bends fabricated in silicon-on-insulator material using deep UV lithography resulting in a large increase in the low-loss bandwidth of the bends. Furthermore, it is experimentally demonstrated that the absolute bandwidth range can be adjusted in a post-fabrication thermal oxidation process.
Keywords :
elemental semiconductors; optical waveguides; oxidation; photonic crystals; silicon-on-insulator; ultraviolet lithography; Si; UV lithography; bandwidth engineering; photonic crystal waveguide bends; silicon-on-insulator material; thermal oxidation process;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20046206
