DocumentCode :
113278
Title :
TSV-based 3D integration fabrication technologies: An overview
Author :
Salah, Khaled
Author_Institution :
Mentor Graphics, Cairo, Egypt
fYear :
2014
fDate :
16-18 Dec. 2014
Firstpage :
253
Lastpage :
256
Abstract :
3D Integration is a promising and attractive solution for interconnect bottleneck problem, transistor scaling physical limitations, and impractical small-scale lithography. 3D integration extends Moore´s law in the third dimension, offering heterogeneous integration, higher density, lower power consumption, and faster performance. However, in order to fabricate 3D ICs, new capabilities are needed: process technology, physical modeling, physical design tools, 3D architectures, design methods and tools. The goal of this paper is to cover the manufacturability of TSV-based 3D-ICs Le. process technology, and fabrication capability.
Keywords :
integrated circuit design; integrated circuit interconnections; integrated circuit manufacture; integrated circuit modelling; semiconductor process modelling; three-dimensional integrated circuits; 3D ICs; 3D architectures; TSV-based 3D integration fabrication; design methods; physical design tools; physical modeling; process technology; Bonding; Silicon; Stacking; Substrates; Three-dimensional displays; Through-silicon vias; 3D Integration; 3D Process; 3D Technology; 3D fabrication; 3D technologies; TSV;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design & Test Symposium (IDT), 2014 9th International
Conference_Location :
Algiers
Type :
conf
DOI :
10.1109/IDT.2014.7038623
Filename :
7038623
Link To Document :
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