• DocumentCode
    1133138
  • Title

    The development of texture in Co-Cr films

  • Author

    Cheng-Zhang, Li ; Lodder, J.C. ; Szpunar, J.A.

  • Author_Institution
    Inst. of Comput. Technol., Acad. Sinica, Beijing, China
  • Volume
    30
  • Issue
    4
  • fYear
    1994
  • fDate
    7/1/1994 12:00:00 AM
  • Firstpage
    1373
  • Lastpage
    1379
  • Abstract
    Texture development as a function of film thickness (5-980 nm) was investigated for two series of Co81Cr19 films. In general, the films were strongly textured. The orientation ratio, ORc, was used to describe the strength of the texture. Experimental data showed that for the Series A films (5-200 nm), the OR c value increased with increasing him thickness, while for Series B films (46-980 nm), the ORc as a function of the film thickness described a single peak curve, with its maximum near 130 nm. The calculated local orientation ratios ORcx for both the Series A and B films had maxima near 110 nm. The strain in Co-Cr films also changes with the film thickness. In the case of the Series B films, the strain along the film normal gradually changed from a tensile to a compressive strain with increasing film thickness, and near 130 nm the film was in a stress-free condition. It was also discovered that for Co-Cr films thinner than 46 nm, the aspect ratio of the grains approaches 1 and the typical columnar structure of grains is not observed, although (0002) fibre texture still exists
  • Keywords
    chromium alloys; cobalt alloys; ferromagnetic properties of substances; magnetic thin films; texture; 46 to 980 nm; 5 to 200 nm; Co-Cr films; Co81Cr19; columnar structure; compressive strain; fibre texture; film thickness; grain aspect ratio; orientation ratio; tensile strain; texture; Capacitive sensors; Chromium; Crystal microstructure; Crystallization; Disk recording; Magnetic films; Magnetic properties; Perpendicular magnetic recording; Sputtering; Tensile strain;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.305535
  • Filename
    305535