DocumentCode
1133138
Title
The development of texture in Co-Cr films
Author
Cheng-Zhang, Li ; Lodder, J.C. ; Szpunar, J.A.
Author_Institution
Inst. of Comput. Technol., Acad. Sinica, Beijing, China
Volume
30
Issue
4
fYear
1994
fDate
7/1/1994 12:00:00 AM
Firstpage
1373
Lastpage
1379
Abstract
Texture development as a function of film thickness (5-980 nm) was investigated for two series of Co81Cr19 films. In general, the films were strongly textured. The orientation ratio, ORc, was used to describe the strength of the texture. Experimental data showed that for the Series A films (5-200 nm), the OR c value increased with increasing him thickness, while for Series B films (46-980 nm), the ORc as a function of the film thickness described a single peak curve, with its maximum near 130 nm. The calculated local orientation ratios ORcx for both the Series A and B films had maxima near 110 nm. The strain in Co-Cr films also changes with the film thickness. In the case of the Series B films, the strain along the film normal gradually changed from a tensile to a compressive strain with increasing film thickness, and near 130 nm the film was in a stress-free condition. It was also discovered that for Co-Cr films thinner than 46 nm, the aspect ratio of the grains approaches 1 and the typical columnar structure of grains is not observed, although (0002) fibre texture still exists
Keywords
chromium alloys; cobalt alloys; ferromagnetic properties of substances; magnetic thin films; texture; 46 to 980 nm; 5 to 200 nm; Co-Cr films; Co81Cr19; columnar structure; compressive strain; fibre texture; film thickness; grain aspect ratio; orientation ratio; tensile strain; texture; Capacitive sensors; Chromium; Crystal microstructure; Crystallization; Disk recording; Magnetic films; Magnetic properties; Perpendicular magnetic recording; Sputtering; Tensile strain;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.305535
Filename
305535
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