DocumentCode :
113321
Title :
Issues in source calibration for biased target ion beam deposition
Author :
Radhakrishnan, N. ; Jeffery, R.D. ; Martyniuk, M. ; Woodward, R.C. ; Dell, J.H. ; Faraone, L.
Author_Institution :
Sch. of Electr. Electron. & Comput. Sci. Eng., Univ. of Western Australia, Perth, WA, Australia
fYear :
2014
fDate :
14-17 Dec. 2014
Firstpage :
141
Lastpage :
143
Abstract :
We report issues associated with the calibration of a biased target ion beam deposition system. Variations in deposition rates and oxygen flow have been observed when depositing individual metal oxide films immediately after films deposited from different targets as compared to depositions following films from the same target.
Keywords :
bismuth compounds; calibration; cerium compounds; ion beam assisted deposition; thin films; (CeBi)3Fe5O12; biased target ion beam deposition; deposition rates; metal oxide films; oxygen flow; source calibration; Australia; Bismuth; Cerium; Educational institutions; Films; Iron; bismuth oxide; cerium oxide; chamber evacuation; chamber passivation; deposition rate; iron oxide; target poisoning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2014 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
978-1-4799-6867-1
Type :
conf
DOI :
10.1109/COMMAD.2014.7038674
Filename :
7038674
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=113321
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