• DocumentCode
    1133573
  • Title

    Modeling TANOS Memory Program Transients to Investigate Charge-Trapping Dynamics

  • Author

    Padovani, Andrea ; Larcher, Luca ; Heh, Dawei ; Bersuker, Gennadi

  • Author_Institution
    DISMI, Univ. di Modena e Reggio Emilia, Reggio Emilia, Italy
  • Volume
    30
  • Issue
    8
  • fYear
    2009
  • Firstpage
    882
  • Lastpage
    884
  • Abstract
    A novel physics-based drift-diffusion model of TANOS program transients is employed to investigate electron trapping and detrapping dynamics in a nitride trapping layer. Trapping process is found to be independent from the energy of injected electrons, while detrapping is dominated by trap-to-band tunneling. Modeling of the trapped-charge evolution during program transients allows one to extract physical characteristics of the traps and provides useful information for the optimization of TANOS memories.
  • Keywords
    aluminium compounds; electron traps; flash memories; silicon; silicon compounds; tantalum compounds; Si-SiO2-SiN-Al2O3-TaN; TANOS memory program transients; charge-trapping dynamics; drift-diffusion model; flash memories; Charge-trapping memory; Shockley–Read–Hall (SRH); TANOS; device physics; flash memory; nitride-based trapping storage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2024622
  • Filename
    5164923