DocumentCode :
1134845
Title :
Stress analysis in silicon die under different types of mechanical loading by finite element method (FEM)
Author :
Yu, Fang ; Sang, Wenbin ; Pang, Enwen ; Liu, Donghua ; Teng, Jianyong
Author_Institution :
Dept. of Electron. Inf. Mater., Shanghai Univ., China
Volume :
25
Issue :
4
fYear :
2002
fDate :
11/1/2002 12:00:00 AM
Firstpage :
522
Lastpage :
527
Abstract :
Stress analysis is of crucial importance in the design of components and systems in the electronics industry. In this paper, the authors present a new strength criterion combined with finite element analysis (FEA) to predict the failure stress of silicon die. Several different models of pushers were designed to apply load in the vfBGA reliability test until some units failed the electrical test. Meanwhile, finite element analysis was performed in order to find the location of the highest stress and the expected modes of failure. In the simulation, a parametric study of the effect of different types of pushers on the internal stress of the die is carried out and the failure stress can be determined eventually. The potential for chip damage under certain pushers during electrical tests has been assessed and the relationship between the maximum principal stress and the thickness of the silicon die is also explored.
Keywords :
ball grid arrays; cracks; failure analysis; finite element analysis; integrated circuit packaging; integrated circuit reliability; internal stresses; stress analysis; FEM; chip damage; die thickness; electrical test; failure modes; failure stress; finite element analysis; inner die cracks; internal stress; maximum principal stress; mechanical loading; pushers; silicon die; strength criterion; stress analysis; stress location; vfBGA reliability test; Assembly; Electronic equipment testing; Electronics industry; Electronics packaging; Failure analysis; Field emitter arrays; Finite element methods; Internal stresses; Materials science and technology; Silicon;
fLanguage :
English
Journal_Title :
Advanced Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
1521-3323
Type :
jour
DOI :
10.1109/TADVP.2002.807561
Filename :
1176479
Link To Document :
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