DocumentCode
1135463
Title
NBTI Reliability of P-Channel Transistors With Diamond-Like Carbon Liner Having Ultrahigh Compressive Stress
Author
Liu, Bin ; Tan, Kian-Ming ; Yang, Mingchu ; Yeo, Yee-Chia
Author_Institution
Dept. of Electr. & Comput. Eng., Nat. Univ. of Singapore, Singapore, Singapore
Volume
30
Issue
8
fYear
2009
Firstpage
867
Lastpage
869
Abstract
Negative bias temperature instability (NBTI) characteristics of p-channel field-effect transistors (p-FETs) with diamond-like carbon (DLC) liner stressor having ultrahigh compressive stress (~ 5 GPa) are investigated for the first time. Ultrafast measurement was employed for NBTI study. Power law slopes ranging from ~ 0.058 to ~ 0.072 are reported here. P-FETs with higher channel strain show greater threshold voltage shift (DeltaVth) and transconductance degradation than those with lower or no channel strain under the same NBT stress condition Vstress. Strained p-FETs with Si S/D and DLC stressors are projected to have an NBTI lifetime of ten years at VG = -0.99 V using Eox power law lifetime extrapolation model or at VG = -0.76 V using the exponential Vstress model.
Keywords
circuit reliability; diamond-like carbon; field effect transistors; NBTI reliability; P-FET; P-channel transistors; diamond-like carbon liner stressor; negative bias temperature instability; power law lifetime extrapolation model; power law slopes; threshold voltage shift; transconductance degradation; ultrahigh compressive stress; voltage -0.76 V; voltage -0.99 V; Diamond-like carbon (DLC); reliability; strain; transistor;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2024332
Filename
5165093
Link To Document