Title :
High-density matrix-addressable AlInGaN-based 368-nm microarray light-emitting diodes
Author :
Chan-Wook Jeon ; Hoi Wai Choi ; Gu, E. ; Dawson, M.D.
Author_Institution :
Inst. of Photonics, Strathclyde Univ., Glasgow, UK
Abstract :
We report on the fabrication of ultraviolet (UV) microarray light-emitting diodes, toward applications including mask-free photolithographic exposure. Devices with 64 × 64 elements have been fabricated in matrix-addressed format, generating directed output powers of up to 1 μW per 20-μm-diameter element at less than 1.0-mA drive current. The resistance of each elemental device was found to depend strongly on the n-GaN stripe length. The center wavelength of the emission was measured to be 368 nm, which is very close to that of an i-line (365 nm) UV light source. To our knowledge, this is the first report detailing the fabrication and performance of such devices operating in the UV.
Keywords :
III-V semiconductors; aluminium compounds; driver circuits; gallium compounds; indium compounds; light emitting diodes; micro-optics; optical arrays; optical fabrication; photolithography; 1 muW; 20 mum; 365 mum; 368 nm; AlInGaN; AlInGaN-based light-emitting diodes; high-density light-emitting diodes; i-line UV light source; light-emitting diode fabrication; mask-free exposure; matrix driver circuit; matrix-addressable light-emitting diodes; matrix-addressed format; microarray light-emitting diodes; photolithographic exposure; ultraviolet light-emitting diodes; Aluminum gallium nitride; DC generators; Fabrication; Gallium nitride; Light emitting diodes; Light sources; Lithography; Power generation; Quantum well devices; Substrates;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2004.835626