• DocumentCode
    1136249
  • Title

    Seeing the shrink - [electronics foundry]

  • Author

    Edwards, Chris

  • Volume
    3
  • Issue
    18
  • fYear
    2008
  • Firstpage
    38
  • Lastpage
    40
  • Abstract
    Intel aims to skip down to the next chipmaking process so that it can either cut the cost of making its microprocessors or put more of them onto one chip. TSMC is working on two forms of the 28 nm process, one using high-k dielectric and metal gates (HKMG) as well as a more conventional silicon oxynitride-gate process. The move to HKMG will allow the company to compete as a foundry with IBM for microprocessor and other high clock-speed designs. Intel already has HKMG in production in its 45 nm-based devices.
  • Keywords
    clocks; high-k dielectric thin films; integrated circuit manufacture; logic design; microprocessor chips; chipmaking process; high clock-speed design; high-k dielectric material; metal gate; microprocessor;
  • fLanguage
    English
  • Journal_Title
    Engineering & Technology
  • Publisher
    iet
  • ISSN
    1750-9637
  • Type

    jour

  • Filename
    4770228