DocumentCode
1136249
Title
Seeing the shrink - [electronics foundry]
Author
Edwards, Chris
Volume
3
Issue
18
fYear
2008
Firstpage
38
Lastpage
40
Abstract
Intel aims to skip down to the next chipmaking process so that it can either cut the cost of making its microprocessors or put more of them onto one chip. TSMC is working on two forms of the 28 nm process, one using high-k dielectric and metal gates (HKMG) as well as a more conventional silicon oxynitride-gate process. The move to HKMG will allow the company to compete as a foundry with IBM for microprocessor and other high clock-speed designs. Intel already has HKMG in production in its 45 nm-based devices.
Keywords
clocks; high-k dielectric thin films; integrated circuit manufacture; logic design; microprocessor chips; chipmaking process; high clock-speed design; high-k dielectric material; metal gate; microprocessor;
fLanguage
English
Journal_Title
Engineering & Technology
Publisher
iet
ISSN
1750-9637
Type
jour
Filename
4770228
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