DocumentCode :
1136649
Title :
Edge-coupled InGaAs PIN photodiode with a light funnel waveguide
Author :
Yang, Chyi-Da ; Lei, Po-Hsun ; Pong, Der-Jin ; Wu, Ming-Yuan ; Ho, Chong-Long ; Wen-Jeng Ho ; Wu, Meng-Chyi ; Cheng, Keh-Yung
Author_Institution :
Dept. of Electr. Eng., Nat. Tsing Hua Univ., Taiwan, Taiwan
Volume :
40
Issue :
11
fYear :
2004
Firstpage :
1607
Lastpage :
1613
Abstract :
We have successfully fabricated InGaAs edge-coupled photodiodes (EC-PDs) with a light funnel integrated (LIFI) in front of the coupling aperture, called LIFI EC-PD, based on the self-terminated oxide polish (STOP), the crystallographic slope etching of InP, and the self-aligned diffusion (SAD) techniques. The LIFI EC-PD presents not only a lower dark current density (∼ 4.4 mA/cm2) but also a higher responsivity (∼ 0.4 A/W) than that of the mesa EC-PD (27 mA/cm2 and 0.26 A/W, respectively). Furthermore, the thick oxide film serves as the funnel in front of active-region aperture to enhance the coupling efficiency and to lower the bonding pad capacitance down to 50 fF. The lowered bonding pad capacitance can be beneficial in designing a device with a higher transit-time-limited frequency response of beyond 30 GHz. The LIFI EC-PD with a 1-μm thick absorption layer exhibits a 3-dB bandwidth of 20 GHz and a responsivity of ∼ 0.4 A/W.
Keywords :
III-V semiconductors; capacitance; current density; etching; gallium arsenide; indium compounds; optical couplers; optical waveguides; p-i-n photodiodes; 1 mum; 20 GHz; 3 dB; InGaAs; LIFI EC-PD; bonding pad capacitance; coupling aperture; crystallographic etching; dark current density; edge-coupled InGaAs pin photodiode; light funnel waveguide; responsivity; self-assigned diffusion; self-terminated oxide polish; Apertures; Bonding; Capacitance; Crystallography; Dark current; Etching; Indium gallium arsenide; Indium phosphide; Optical coupling; PIN photodiodes; Crystallographic etching; EC-PD; SAD; STOP; edge-coupled photodiodes; funnel waveguide; light funnel; self-aligned diffusion; self-terminated oxide polish;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.2004.830184
Filename :
1344142
Link To Document :
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