Title :
Simultaneous UV direct writing of channel waveguides and Bragg gratings in germanium-doped planar silica
Author :
Marques, Paulo V S ; Bonar, Jim R. ; Leite, António M P ; Aitchison, J.S.
Abstract :
Channel waveguides incorporating photo-imprinted Bragg gratings were produced in germano-borosilicate glass layers fabricated by flame hydrolysis deposition, through single- and double-step exposure direct writing processes with UV laser irradiation. To our knowledge, this is the first time that UV exposure has been used to simultaneously realize both waveguiding and spectral selectivity functions.
Keywords :
Bragg gratings; borosilicate glasses; germanate glasses; optical fabrication; optical glass; optical planar waveguides; ultraviolet lithography; B2O3-SiO2:Ge; GeO2-B2O3-SiO2; UV exposure; UV laser irradiation; channel waveguides; double-step exposure direct writing processes; flame hydrolysis deposition; germanium-doped planar silica; germano-borosilicate glass layers; photo-imprinted Bragg gratings; simultaneous UV direct writing; single-step exposure direct writing processes; spectral selectivity functions; waveguiding functions; Bragg gratings; Etching; Fires; Glass; Optical waveguides; Planar waveguides; Silicon compounds; Ultraviolet sources; Waveguide lasers; Writing;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2002.806730
