DocumentCode :
1137008
Title :
Monolithic integration of a multiwavelength laser array associated with asymmetric sampled grating lasers
Author :
Ryu, Sang-Wan ; Kim, Sung-Bock ; Sim, Jae-Sik ; Kim, Jeha
Author_Institution :
Electron. & Telecommun. Res. Inst., Taejon, South Korea
Volume :
8
Issue :
6
fYear :
2002
Firstpage :
1358
Lastpage :
1365
Abstract :
We present a novel approach for a monolithically integrated multiwavelength laser array based on asymmetric sampled grating lasers. The asymmetric sampled grating laser combines sampled gratings of different periods with an index shifter to utilize the first-order reflection for lasing operation. With this structure, a simple fabrication procedure as well as high yield could be achieved without using complex and time-consuming e-beam lithography for multiperiod gratings. With numerical analysis based on a transfer matrix method, the effect of grating strength and mirror coating was analyzed to improve single-mode and power extraction performance. By using high-reflection/antireflection coatings on both facets, it was shown theoretically that high-power extraction efficiency as well as high single-mode yield was achieved. A four-channel laser array with 400-GHz wavelength spacing was fabricated and its operation at designed wavelengths was demonstrated. The individual laser showed a threshold current of 9-13 mA and a slope efficiency of around 0.21 W/A. A high sidemode suppression ratio over 44 dB was observed as well.
Keywords :
antireflection coatings; diffraction gratings; distributed feedback lasers; electron beam lithography; integrated optoelectronics; laser modes; matrix algebra; optical communication equipment; semiconductor laser arrays; wavelength division multiplexing; 9 to 13 mA; antireflection coatings; asymmetric sampled grating lasers; fabrication procedure; first-order reflection; grating strength; high sidemode suppression ratio; high-reflection coatings; lasing operation; mirror coating; monolithic integration; monolithically integrated multiwavelength laser array; multiperiod gratings; multiwavelength laser array; numerical analysis; power extraction performance; single-mode yield; threshold current; time-consuming e-beam lithography; transfer matrix method; wavelength spacing; Coatings; Gratings; Laser theory; Lithography; Mirrors; Monolithic integrated circuits; Numerical analysis; Optical arrays; Optical device fabrication; Optical reflection;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2002.806696
Filename :
1176680
Link To Document :
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