• DocumentCode
    1137642
  • Title

    Process development and adhesion behavior of electroless copper on liquid crystal polymer (LCP) for electronic packaging application

  • Author

    Chen, Liu ; Crnic, Midhat ; Lai, Zonghe ; Liu, Johan

  • Author_Institution
    Sch. of Mech. Eng., Chalmers Univ. of Technol., Goteborg, Sweden
  • Volume
    25
  • Issue
    4
  • fYear
    2002
  • fDate
    10/1/2002 12:00:00 AM
  • Firstpage
    273
  • Lastpage
    278
  • Abstract
    Liquid crystal polymer (LCP) has potentially a very wide application as substrate material in electronic packaging applications because of its unique advantages. The work in this paper was performed to realize the metallization of LCP for the purpose of board fabrication, and to study the adhesion between deposited copper and LCP. A homogenous electroless plated copper layer on LCP with 4 to 5 μm thickness was achieved, while it increased up to 40 μm with the subsequent electroplating. The timescale of etching, deposit ion rate, and pH value were gradually changing during the plating process and the influences on copper layer quality were investigated. The adhesion force of the copper-LCP layer system was measured by a shear-off-method. Scanning electron microscopy (SEM) was used to check the surface morphology after etching and the interface after shearing on both the backside of the copper layer and the LCP side. The relationship between the shear-off adhesion of copper and the time of chemical etching before plating was examined, and the optimal etching time is discussed. Heat treatment after plating was used, and it was shown that this significantly improved the adhesion strength.
  • Keywords
    adhesion; copper; electroless deposition; etching; heat treatment; humidity; interface phenomena; liquid crystal polymers; metallisation; packaging; scanning electron microscopy; substrates; surface topography; 4 to 5 micron; 40 micron; Cu; Cu-LCP layer system; SEM; adhesion behavior; adhesion force measurement; adhesion strength; board fabrication; chemical etching; copper layer quality; electroless plated Cu layer; electronic packaging application; electroplating; heat treatment; humidity; interface region; liquid crystal polymer; localized current induced heating; mechanical interlocking; metallization; microstructure study; optimal etching time; process development; roughness; scanning electron microscopy; shear-off-method; substrate material; surface morphology; Adhesives; Copper; Crystalline materials; Electronics packaging; Etching; Fabrication; Force measurement; Liquid crystal polymers; Metallization; Scanning electron microscopy;
  • fLanguage
    English
  • Journal_Title
    Electronics Packaging Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-334X
  • Type

    jour

  • DOI
    10.1109/TEPM.2002.807722
  • Filename
    1176909