• DocumentCode
    1139977
  • Title

    460-nm InGaN-Based LEDs Grown on Fully Inclined Hemisphere-Shape-Patterned Sapphire Substrate With Submicrometer Spacing

  • Author

    Chang, Chia-Ta ; Hsiao, Shih-Kuang ; Chang, Edward Yi ; Hsiao, Yu-Lin ; Huang, Jui-Chien ; Lu, Chung-Yu ; Chang, Huang-Choung ; Cheng, Kai-Wen ; Lee, Ching-Ting

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • Volume
    21
  • Issue
    19
  • fYear
    2009
  • Firstpage
    1366
  • Lastpage
    1368
  • Abstract
    This letter investigates 460-nm InGaN-based light-emitting diodes (LEDs) grown on a hemisphere-shape- patterned sapphire substrate (HPSS) with submicrometer spacing. The full-width at half-maximum of the (102) plane rocking curves for GaN layer grown on a conventional sapphire substrate (CSS) and HPSS are 480 and 262 arcsec, respectively. Such improvement is due to the reduction of the pure edge threading dislocations. At the forward current of 20 mA, the light output power of the LEDs grown on CSS and HPSS were 4.05 and 5.86 mW, respectively. This improvement of 44% light-output power can be attributed to the improved quality of the material and the increase of the light extraction by the fully inclined facets of the HPSS.
  • Keywords
    III-V semiconductors; edge dislocations; gallium compounds; indium compounds; light emitting diodes; sapphire; wide band gap semiconductors; Al2O3; InGaN; LED; current 20 mA; edge threading dislocations; fully inclined hemisphere-shape-patterned sapphire substrate; light-emitting diodes; power 4.05 mW; power 5.86 mW; wavelength 460 nm; Edge threading dislocations; light-emitting diodes (LEDs); patterned sapphire; submicrometer;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2009.2026728
  • Filename
    5166516