DocumentCode :
1139977
Title :
460-nm InGaN-Based LEDs Grown on Fully Inclined Hemisphere-Shape-Patterned Sapphire Substrate With Submicrometer Spacing
Author :
Chang, Chia-Ta ; Hsiao, Shih-Kuang ; Chang, Edward Yi ; Hsiao, Yu-Lin ; Huang, Jui-Chien ; Lu, Chung-Yu ; Chang, Huang-Choung ; Cheng, Kai-Wen ; Lee, Ching-Ting
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
21
Issue :
19
fYear :
2009
Firstpage :
1366
Lastpage :
1368
Abstract :
This letter investigates 460-nm InGaN-based light-emitting diodes (LEDs) grown on a hemisphere-shape- patterned sapphire substrate (HPSS) with submicrometer spacing. The full-width at half-maximum of the (102) plane rocking curves for GaN layer grown on a conventional sapphire substrate (CSS) and HPSS are 480 and 262 arcsec, respectively. Such improvement is due to the reduction of the pure edge threading dislocations. At the forward current of 20 mA, the light output power of the LEDs grown on CSS and HPSS were 4.05 and 5.86 mW, respectively. This improvement of 44% light-output power can be attributed to the improved quality of the material and the increase of the light extraction by the fully inclined facets of the HPSS.
Keywords :
III-V semiconductors; edge dislocations; gallium compounds; indium compounds; light emitting diodes; sapphire; wide band gap semiconductors; Al2O3; InGaN; LED; current 20 mA; edge threading dislocations; fully inclined hemisphere-shape-patterned sapphire substrate; light-emitting diodes; power 4.05 mW; power 5.86 mW; wavelength 460 nm; Edge threading dislocations; light-emitting diodes (LEDs); patterned sapphire; submicrometer;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2009.2026728
Filename :
5166516
Link To Document :
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