DocumentCode
1140015
Title
Ionization-induced carrier transport in InAlAs/InGaAs high electron mobility transistors
Author
McMorrow, Dale ; Knudson, Alvin R. ; Boos, J. Brad ; Park, Doe ; Melinger, Joseph S.
Author_Institution
Naval Res. Lab., Washington, DC, USA
Volume
51
Issue
5
fYear
2004
Firstpage
2857
Lastpage
2864
Abstract
Time resolved charge-collection measurements and two-dimensional device simulations performed on InAlAs/InGaAs high electron mobility transistors (HEMTs) for ion and pulsed laser excitation address the mechanisms of charge collection and enhancement in these heterostructure devices. The results are compared to those for bulk GaAs field-effect transistors. In the HEMTs, the ionization-induced enhancement current is associated with a significant lowering of the source/channel barrier, and is largely confined to the InGaAs well. The simulations suggest that the primary contributor to the barrier lowering is an excess hole density that develops in the InAlAs buffer layer.
Keywords
aluminium compounds; high electron mobility transistors; hole density; indium compounds; semiconductor quantum wells; HEMT; InAlAs buffer layer; InAlAs/InGaAs high electron mobility transistors; InGaAs well; InP; SEU; bulk GaAs field-effect transistors; heterostructure devices; hole density; ion excitation; ionization-induced carrier transport; pulsed laser excitation; single-event effects; single-event upsets; source-channel barrier; time resolved charge-collection measurements; two-dimensional device simulations; Charge measurement; Current measurement; HEMTs; Indium compounds; Indium gallium arsenide; MODFETs; Optical pulses; Performance evaluation; Pulse measurements; Time measurement; Device simulation; HEMT; InGaAs; InP; SEEs; SEUs; high electron mobility transistor; single-event effects; single-event upsets;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2004.835060
Filename
1344429
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