DocumentCode :
1140050
Title :
The Dose Effect in Secondary Electron Emission
Author :
Kumar, Prashanth ; Watts, Christopher ; Svimonishvili, Tengiz ; Gilmore, Mark ; Schamiloglu, Edl
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of New Mexico, Albuquerque, NM, USA
Volume :
37
Issue :
8
fYear :
2009
Firstpage :
1537
Lastpage :
1551
Abstract :
In this paper, total incident electron dose as an inherent parameter in secondary electron emission is experimentally demonstrated. A completely automated experimental setup allows for measuring of secondary electron yield (SEY) as a function of beam energy, angle of incidence of primary electrons, electron dose, and time. SEY data are presented for copper, plasma-sprayed boron carbide, and titanium nitride samples with principal focus on dose dependence. Experiments were conducted in the low-energy range (5-1000 eV) and direct-current regime. Experimental results have been compared with formulas in literature, and good agreement was observed. Modified empirical formulas incorporating the dose effect have also been proposed.
Keywords :
boron compounds; copper; plasma arc spraying; plasma-beam interactions; secondary electron emission; titanium compounds; B4C; Cu; TiN; copper; dose effect; electron volt energy 5 eV to 1 keV; high-power microwaves; plasma-sprayed boron carbide; secondary electron emission; secondary electron yield; titanium nitride; Dose effect; high-power microwaves (HPMs); secondary electron emission (SEE); secondary electron yield (SEY);
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2009.2022970
Filename :
5166523
Link To Document :
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