DocumentCode :
1140061
Title :
Fabrication of Titanium-Doped Indium Oxide Films for Dye-Sensitized Solar Cell Application Using Reactive RF Magnetron Sputter Method
Author :
Heo, Jong-Hyun ; Jung, Ki-Young ; Kwak, Dong-Joo ; Lee, Don-Kyu ; Sung, Youl-Moon
Author_Institution :
Dept. of Electr. & Electron. Eng., Kyungsung Univ., Busan, South Korea
Volume :
37
Issue :
8
fYear :
2009
Firstpage :
1586
Lastpage :
1592
Abstract :
To develop high-efficiency transparent conductive oxide glass in a longer wavelength zone for dye-sensitized solar cell (DSC) application, we fabricate titanium-doped indium oxide (ITiO) films on a soda-lime glass substrate by an RF magnetron sputtering. The ITiO films showed a minimum resistivity of 1.25 times 10-3 Omega ldr cm. The transmittance increases from 80% at 450 nm to 90% at 700 nm in the visible spectrum. From the atomic force microscopy result, the surface roughness of the sample showed a change from 10 to 50 nm with annealing temperature. From the XPS result, the concentration ratio (%) for In, Ti, and O was 27 : 2 : 42. The annealing treatment on the ITiO films improves the photovoltaic characteristics of the ITiO-based DSCs, and energy conversion efficiency (eta) is 5.79% (FF: 0.62, Voc: 0.71 V, Jsc: 13.23 mA/cm2) at 100-mW/cm2 light intensity.
Keywords :
annealing; electrical resistivity; indium compounds; solar cells; sputter deposition; surface roughness; titanium; visible spectra; InO2:Ti; XPS; annealing temperature; atomic force microscopy; dye-sensitized solar cell; photovoltaic characteristics; reactive RF magnetron sputter method; surface roughness; visible spectrum; Dye-sensitized solar cells (DSCs); RF magnetron sputtering; titanium-doped indium oxide (ITiO); transparent conductive oxide (TCO);
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2009.2023477
Filename :
5166524
Link To Document :
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