DocumentCode :
1141184
Title :
Pulsed discharge initiated chemical lasers - Part II: HF laser emission from NF3 and N2 F4 systems
Author :
Green, W. ; Lin, Man
Author_Institution :
Naval Research Laboratory, Washington, DC, USA
Volume :
7
Issue :
2
fYear :
1971
fDate :
2/1/1971 12:00:00 AM
Firstpage :
98
Lastpage :
101
Abstract :
A transverse, multiple-arc pulsed discharge has produced laser emission in NF3 and N2 F4 mixed with H2 , CH4 , C2 H6 , HCl, HBr, and natural gas. 
, and P43 HF transitions were observed. The peak powers measured ranged from ∼8.5 to 25 kW with typical pulsewidths of 
s.
, and P s.Keywords :
Chemical lasers; Delay; Detectors; Gas lasers; Hafnium; Natural gas; Noise measurement; Optical pulses; Pulse measurements;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1971.1076601
Filename :
1076601
Link To Document :
